Depth profile of tritium in plasma exposed CX-2002U

Depth profiles of the Ag grains density in autoradiographs, which represent tritium concentration in CX-2002U samples exposed to high flux D/T particles under various conditions, were examined and the apparent diffusion coefficients were estimated from the profiles. Plasma discharge generating D/T atomized particles with low energies increases tritium inventory in the samples by introducing high tritium concentration on the surface exposed and following diffusion process into the deep region with apparent diffusion coefficients (1.7×10−16 m2/s at 293 K and 2.3×10−15 m2/s at 573 K), which are much larger than the diffusion coefficients in the bulk reported. Oxygen RF-plasma exposure might be effective to remove tritium retained even at a fairly deep region in carbon fiber composite (CFC) components.