• Title of article

    Chemical erosion of boronized films from DIII-D tiles

  • Author/Authors

    Davis، نويسنده , , J.W. and Wright، نويسنده , , P.B. and Macaulay-Newcombe، نويسنده , , R.G. and Haasz، نويسنده , , A.A. and Hamilton، نويسنده , , C.G.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    5
  • From page
    66
  • To page
    70
  • Abstract
    Tile specimens from the DIII-D tokamak have been studied to determine their erosion characteristics when exposed to D+ ions and O2 gas. Here, we report results for tile surfaces from the outer midplane. Surface analyses (EDX, XPS, SIMS) indicate that the surface layer is composed primarily of boron, with an overlayer of a B/C mixture. Total hydrocarbon (ΣCiDj) erosion yields were initially found to be ∼0.01–0.02 C/D+, with limited variations due to D+ energy (50 or 200 eV) or specimen temperature (300–700 K). Erosion yields were seen to decrease with fluence by a factor of 1.5–2 over the range ∼4×1021–3×1022 D+/m2. Above ∼3×1022 D+/m2 the yields level off. The initial erosion yields are found to be consistent with those for boron-doped graphite. O2 gas exposure at 523 or 623 K initially removed ∼25% of the trapped D; however, the remaining D could not be removed by baking in O2 at temperatures up to 623 K.
  • Keywords
    Co–deposition , Boronization , Boronized carbon film , Chemical erosion , DIII-D
  • Journal title
    Journal of Nuclear Materials
  • Serial Year
    2001
  • Journal title
    Journal of Nuclear Materials
  • Record number

    1348703