Title of article
Stress measurements during thin film zirconium oxide growth
Author/Authors
Kim، نويسنده , , Yong-soo and Jeong، نويسنده , , Yong-Hwan and Jang، نويسنده , , Jeong-Nam، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
4
From page
217
To page
220
Abstract
Stress accumulation during thin film zirconium oxide growth was successfully measured using new curvature measurement technique and stress of up to 5.1 GPa was observed in an approximately 50 nm thick oxide film. Experimental results also show that steam and air oxidation make little difference in the stress profile on the oxide film thickness, especially during the early stage of oxidation. This result possibly supports the theory that zirconium corrosion kinetics crucially depends on the oxide phase transformation at the metal–oxide interface. Apparent discrepancies between previous studies were interpreted in terms of stress relaxation effects on the measurements.
Journal title
Journal of Nuclear Materials
Serial Year
2011
Journal title
Journal of Nuclear Materials
Record number
1362450
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