Characterization of (Ba, Sr)RuO3 films deposited by metal organic chemical vapor deposition

(Ba, Sr)RuO3 oxide electrodes have been studied for high dielectric (Ba, Sr)TiO3 film in DRAM capacitors. Metal organic chemical vapor deposition (MOCVD) is used for large-scale deposition and provides better step coverage properties. In this work, methoxyethoxytetramethylheptanedionate (METHD) precursor and solvent [n-butylacetate(C6H12O2)] were mixed together into a single solution source. Post deposition annealing is carried out in oxygen atmosphere using rapid thermal annealing (RTA) to investigate the effect of organic impurities such as carbon during deposition. After annealing, resistivity of the BSR film decreased drastically compared to the as-deposited film. X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) analysis were used to describe this phenomenon accurately. The decrease in carbonate with increasing annealing time was confirmed by XRD analysis.