Photopatterning hybrid sol–gel glass materials prepared from ethylene tellurate and alkoxysilane

Photopatterning of sol–gels is a versatile technique that has been used to prepare optical components and devices of silica and titania. Telluria (TeO2) has a higher third-order non-linearity than silica and titania and offers advantages in optical devices. Ethylene tellurate was used as a high purity precursor in the preparation of nanoparticulate tellurium dioxide powders and glassy films by sol–gel processes. Powder and film samples were characterized by XRD, SEM and FTIR. The refractive index of the sol–gel derived telluria film was 1.67. [3-(Methacryloloxypropyl)]trimethoxysilane (MPTMS) was incorporated into ethylene tellurate sol–gels in order to allow photopatterning by polymerization and cross-linking of methacrylate functionality. UV exposure of films with a photomask was used to produce line patterns. FTIR measurements showed the disappearance of acrylate double bonds in MPTMS, indicating the polymerization and condensation of the films.