Title of article
Quantum chemical study of parasitic reaction in III–V nitride semiconductor crystal growth
Author/Authors
Koichi Nakamura، نويسنده , , Osamu Makino، نويسنده , , Akitomo Tachibana، نويسنده , , Koh Matsumoto، نويسنده ,
Issue Information
دوفصلنامه با شماره پیاپی سال 2000
Pages
11
From page
514
To page
524
Abstract
We have discussed the gas-phase parasitic reactions in M(CH3)3/H2/NH3 systems following the elimination of methane by carrying out ab initio quantum chemical calculations, where M denotes Al, Ga, or In. It is clearly shown that the Al source gases enhance reactivity, and the adduct-derived chain compounds grow successively with high exothermicity. We have concluded that the strong Al–N coordination interaction contributes remarkably to the stabilization of the reaction system. In the presence of excess ammonia, we have proved that potential energy barrier of the methane elimination is reduced considerably. The methane elimination by reaction of carrier H2 gas with M(CH3)3 is also exothermic.
Keywords
Quantum chemical calculation , Gas-phase reaction , Regional density functional theory , Parasitic reactions , Nitride semiconductor
Journal title
Journal of Organometallic Chemistry
Serial Year
2000
Journal title
Journal of Organometallic Chemistry
Record number
1371308
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