• Title of article

    Trap-limited diffusion of hydrogen in precursor derived amorphous Si–B–C–N-ceramics

  • Author/Authors

    Gruber، نويسنده , , W. and Borchardt، نويسنده , , G. and Schmidt، نويسنده , , H.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2007
  • Pages
    7
  • From page
    4121
  • To page
    4127
  • Abstract
    The tracer diffusion of hydrogen is studied in precursor derived amorphous Si–C–N and Si–B–C–N ceramics using deuterium as a tracer and secondary ion mass spectrometry (SIMS). Since the amorphous ceramics are separated in carbon rich phases (amorphous carbon and amorphous C(BN)x, respectively) and silicon rich phases (amorphous Si3N4 and amorphous Si3+(1/4)xCxN4−x, respectively) we additionally measured the diffusivities of hydrogen in amorphous carbon, in amorphous SiC and in amorphous C–B–N films. The silicon rich phases are identified as diffusion paths for hydrogen in the precursor derived ceramics. Diffusion of hydrogen in these materials is explained with a trap limited diffusion mechanism with a single trap level. We found activation enthalpies of about 2 eV for the precursor derived ceramics, where the activation enthalpy is the sum of a migration enthalpy and a binding enthalpy. The low values for the pre-exponential factors of less than 10−7 m2/s can be explained with an appropriate expression for the entropy factor.
  • Keywords
    Amorphous semiconductors , ceramics , carbon , silicon carbide , Diffusion and transport , Secondary ion mass spectroscopy , Silicon
  • Journal title
    Journal of Non-Crystalline Solids
  • Serial Year
    2007
  • Journal title
    Journal of Non-Crystalline Solids
  • Record number

    1381649