Deposition and characterization of hex-BN coating on carbon fibres using tris(dimethylamino)borane precursor

Boron nitride thin films were deposited on carbon fibres by chemical vapor deposition from the single source precursor tris(dimethylamino)borane (TDMAB). Hydrogen was used as carrier gas and additional nitrogen was supplied in the form of ammonia. The heating of the substrate was performed by Joule effect. Detailed TEM structural and chemical analyses reveal a meso-graphitic structure with a stoichiometric B/N ratio as confirmed by Auger Electron Spectroscopy (AES). A penetration of carbon element from the fibre was observed in the BN layer close to the interface.