Preparation of ultrathin PZT films by a chemical solution deposition method from a polymeric citrate precursor

Ultrathin PZT film was prepared using a chemical solution deposition method from polymeric citrate precursors. The PZT solution was spin-coated on an amorphous silica layer formed on a Si(1 0 0) substrate. The films were thermally treated from the substrate side with a low heating rate (1°/min) up to 700 °C and finally annealed for 10 h. Ultrathin PZT films without microstructural instability were prepared in spite of high temperature and long annealing time. AFM and HRTEM investigations revealed the formation of a well-developed dense microstructure consisting of spherical crystallites (4–7 nm). Low roughness (2.2 nm) of a ∼26 nm thick layer was obtained for a two-layered PZT film. The grazing incidence X-ray diffraction (GIXRD) measurements confirmed the polycrystalline structure of ultrathin PZT films. Also, GIXRD and electron energy dispersive X-ray (EDS) analysis showed that compositional variations were smaller than expected, in spite of the long annealing time.