• Title of article

    Radical depletion model for intensity effects on photopolymerization

  • Author/Authors

    Tomeckova، نويسنده , , Vladislava and Halloran، نويسنده , , John W.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2013
  • Pages
    11
  • From page
    25
  • To page
    35
  • Abstract
    Photopolymerization behavior of suspensions based on monomers is determined by the curing kinetics of the monomer, the concentration of photoactives such as photoinitiator, inert dye or inhibitor, and the conditions of polymerization such as light intensity. We present a Radical depletion model, an extended Inhibitor exhaustion model, in terms of minimum light intensity that is required for initiation of the photopolymerization. The validity of this model was tested on a series of (meth)acrylate suspensions with varying the photoactives concentration in the intensity range ∼8–40 mW/cm2.
  • Keywords
    Photopolymerization , Suspension , sio2 , (Meth)acrylates
  • Journal title
    Journal of the European Ceramic Society
  • Serial Year
    2013
  • Journal title
    Journal of the European Ceramic Society
  • Record number

    1414682