Title of article
Radical depletion model for intensity effects on photopolymerization
Author/Authors
Tomeckova، نويسنده , , Vladislava and Halloran، نويسنده , , John W.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2013
Pages
11
From page
25
To page
35
Abstract
Photopolymerization behavior of suspensions based on monomers is determined by the curing kinetics of the monomer, the concentration of photoactives such as photoinitiator, inert dye or inhibitor, and the conditions of polymerization such as light intensity. We present a Radical depletion model, an extended Inhibitor exhaustion model, in terms of minimum light intensity that is required for initiation of the photopolymerization. The validity of this model was tested on a series of (meth)acrylate suspensions with varying the photoactives concentration in the intensity range ∼8–40 mW/cm2.
Keywords
Photopolymerization , Suspension , sio2 , (Meth)acrylates
Journal title
Journal of the European Ceramic Society
Serial Year
2013
Journal title
Journal of the European Ceramic Society
Record number
1414682
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