Title of article
Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells
Author/Authors
Biro، نويسنده , , D. and Preu، نويسنده , , R. and Schultz، نويسنده , , O. and Peters، نويسنده , , S. and Huljic، نويسنده , , D.M. and Zickermann، نويسنده , , D. and Schindler، نويسنده , , R. and Lüdemann، نويسنده , , R. and Willeke، نويسنده , , G.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
7
From page
35
To page
41
Abstract
A novel diffusion system for in-line rapid thermal diffusion is presented. The lamp-heated furnace has a low thermal mass and a metal free transport system based on the walking beam principle. The furnace has been used to process first solar cells with lightly and highly doped emitters respectively. Solar cells with shallow lightly doped emitters show that the emitters processed in the new device can be well passivated. Shallow emitters with sheet resistances of up to 40 /sq. have been contacted successfully by means of screen printing and firing through a SiNx antireflection coating.
Keywords
Silicon solar cells , Rapid thermal processing , Manufacturing and processing , screen printing
Journal title
Solar Energy Materials and Solar Cells
Serial Year
2002
Journal title
Solar Energy Materials and Solar Cells
Record number
1478105
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