Title of article
Induced structural damages by He+ irradiation in conducting transparent indium–tin oxide thin films
Author/Authors
Maaza، نويسنده , , M. and Nemraoui، نويسنده , , O. and Beye، نويسنده , , A.C. and Sella، نويسنده , , C. and Derry، نويسنده , , T.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
9
From page
111
To page
119
Abstract
Irradiation of polycrystalline sputter-deposited ITO thin films on float-glass substrates was performed with high-energy MeV He+ ion beam implantation at doses in the range 2–6×10+15 ions/cm2. A significant change in both surface morphology and crystallographic structure after implantation was observed. It results in a crystallographic disorder of large crystallites with the ion dose, creation of electronic defects and a roughening of the ITO thin-films’ surface.
Keywords
Transparent conducting materials , indium tin oxide , Thin films , Ion beam implantation , Structural damages
Journal title
Solar Energy Materials and Solar Cells
Serial Year
2006
Journal title
Solar Energy Materials and Solar Cells
Record number
1480069
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