Technological process for a new silicon solar cell structure with honeycomb textured front surface

This paper presents a new silicon solar-cell structure improved by texturisation of the front surface using silicon micromachining technologies. A ‘honeycomb’-textured front surface has been obtained through a photolithographical process to generate patterns (disc holes) on the front surface followed by isotropic etching (in HNO3: HF: CH3COOH) until the wells joined together. ont-surface loss characterisation, the spectral dependence of the front-surface reflectivity has been investigated by spectrophotometrical measurements. The surface reflectivity was lowered under 10% and this value was a good one compared to the reflectivity of silicon monocrystalline wafer untextured surface. The p–n junction made by phosphorous diffusion at ∼0.8 μm follows the honeycomb profile. In order to obtain low series resistance, a p+ boron diffusion on the back of the structure was made. The fabrication process was completed with an ohmic contact (Al on top and on the back surface).