Title of article
A study of the electrochemical performance of vanadium oxide thin films grown by atmospheric pressure chemical vapour deposition
Author/Authors
Vernardou، نويسنده , , D. and Paterakis، نويسنده , , P. and Drosos، نويسنده , , H. and Spanakis، نويسنده , , E. and Povey، نويسنده , , I.M. and Pemble، نويسنده , , M.E. and Koudoumas، نويسنده , , E. and Katsarakis، نويسنده , , N.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
6
From page
2842
To page
2847
Abstract
Thin films of vanadium oxide were deposited on glass substrates at 450 oC by atmospheric pressure chemical vapour deposition. The effect of the vanadium tetrachloride to water precursor ratio on the structural and morphological properties of the films was investigated. The water concentration was observed to strongly affect the vanadium oxidation state and the morphological characteristics of the films. The importance of achieving single-phase of a particular oxidation state towards the improvement of the electrochemical performance of thin films grown by atmospheric pressure CVD is highlighted.
Keywords
Vanadium oxides , Atmospheric pressure chemical vapour deposition , Cyclic voltammetry , Electrochemical properties , Electrochromics
Journal title
Solar Energy Materials and Solar Cells
Serial Year
2011
Journal title
Solar Energy Materials and Solar Cells
Record number
1486263
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