Title of article
Powder X-ray diffraction pattern of NbSi1.9 containing planar stacking faults
Author/Authors
Yamane، نويسنده , , Hisanori and Sato، نويسنده , , Hiroto and Yamada، نويسنده , , Takahiro، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2012
Pages
4
From page
189
To page
192
Abstract
The X-ray powder diffraction pattern of NbSi1.9 prepared by heating Nb and Si powders with Na at 900 K for 48 h in Ar was analyzed by the Rietveld method. The broadening peaks of X-ray reflections suggested stacking faults of the C40 structure. The XRD pattern was simulated with a stacking fault model using DIFFaX.
Keywords
miscellaneous , B. Crystallography , F. Diffraction , C. Reaction synthesis , A. Intermetallics
Journal title
Intermetallics
Serial Year
2012
Journal title
Intermetallics
Record number
1505262
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