Title of article
Recent developments in fluorine chemistry for microelectronic applications: Some examples at Comurhex
Author/Authors
Jourdan، نويسنده , , A and Morel، نويسنده , , B، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
10
From page
255
To page
264
Abstract
High purity fluorides are very important for microelectronic applications. In this article, we have reviewed how to prepare, handle and analyse such products as WF6 and ClF3, respectively, a tungsten precursor for metal interconnects and an efficient cleaning agent. Material choice and passivation coupled with high performance analytical studies are the key factors to maintain the highest required purity. This methodology can be extended to other reactive fluorochemicals.
Keywords
fluorine , Microelectronic gases , Chlorine trifluoride , Cleaning , Metallization , Tungsten hexafluoride
Journal title
Journal of Fluorine Chemistry
Serial Year
2001
Journal title
Journal of Fluorine Chemistry
Record number
1603067
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