• Title of article

    Recent developments in fluorine chemistry for microelectronic applications: Some examples at Comurhex

  • Author/Authors

    Jourdan، نويسنده , , A and Morel، نويسنده , , B، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    10
  • From page
    255
  • To page
    264
  • Abstract
    High purity fluorides are very important for microelectronic applications. In this article, we have reviewed how to prepare, handle and analyse such products as WF6 and ClF3, respectively, a tungsten precursor for metal interconnects and an efficient cleaning agent. Material choice and passivation coupled with high performance analytical studies are the key factors to maintain the highest required purity. This methodology can be extended to other reactive fluorochemicals.
  • Keywords
    fluorine , Microelectronic gases , Chlorine trifluoride , Cleaning , Metallization , Tungsten hexafluoride
  • Journal title
    Journal of Fluorine Chemistry
  • Serial Year
    2001
  • Journal title
    Journal of Fluorine Chemistry
  • Record number

    1603067