Title of article
Radical-based reduction of phosphine sulfides and phosphine selenides by (Me3Si)3SiH
Author/Authors
Romeo، نويسنده , , Roberto and Wozniak، نويسنده , , Lucyna A and Chatgilialoglu، نويسنده , , Chryssostomos، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
4
From page
9899
To page
9902
Abstract
Tris(trimethylsilyl)silane reacts with phosphine sulfides and phosphine selenides under free radical conditions to give the corresponding phosphines in good yields. Stereochemical studies on P-chiral phosphine sulfides show these reductions proceed with retention of configuration.
Keywords
Phosphine sulfides , Reduction , radical reactions
Journal title
Tetrahedron Letters
Serial Year
2000
Journal title
Tetrahedron Letters
Record number
1640563
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