X-ray induced nonbridging oxygen hole center in soda-lime silicate glass

Defects induced by X-ray irradiation in the soda-lime silicate glass were studied by means of optical spectrophotometric and electron spin resonance measurements. The defects attributed to three absorption peaks at 610, 425 and 305 nm which were observed in the glass after X-ray radiation. The induced defects were unstable at room temperature or after thermal annealing treatment. The Smakulaʹs formula was applied to calculate the induced defects, and the concentration of induced NBOHC correlating the absorption band at 610 nm in glass after X-ray irradiation for 35 min was calculated to be about 9.80 × 1018/cm3. The linear relationship between NBOHC number and absorption at 610 nm confirmed that the absorption at 610 nm may attribute to the induced NBOHCs.