Derivative photoelectron holography of As/Si(001)

The new technique of derivative photoelectron holography is used to examine the As-terminated Si(001) surface, which exhibits a two-domain (2×1) reconstruction. Logarithmic derivatives of the photoemission intensity are measured, from which the intensity fine structure function is deduced. Since the logarithmic derivative function is independent of the incident beam intensity and the detection efficiency, most experimental uncertainties are eliminated. The resulting atomic images are in good agreement with expectation.