Title of article
An applicability of scanning tunneling microscopy for surface electron spectroscopy
Author/Authors
Tomitori، نويسنده , , M. and Hirade، نويسنده , , M. and Suganuma، نويسنده , , Y. and Arai، نويسنده , , T.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
7
From page
49
To page
55
Abstract
Electron energy loss and Auger electron spectra have been obtained for Si(1 1 1) covered with 0.02 bilayer Ge with a scanning tunneling microscope (STM) combined with an electron energy analyzer. The Ge islands with 5×5 and 7×7 reconstructions grown on the step and the domain boundaries of the Si(1 1 1)7×7 substrate are imaged with the STM. After STM imaging, the STM tip is retracted and the primary electron beam for these spectroscopies is field emitted from the tip of build-up [1 1 1]-oriented W, which has the most protruding point of the [1 1 1] apex. Several energy peaks are found, which are probably attributed to plasmon and to Auger electrons of Si LVV and Ge MVV. The origin of anomalous peak shift with decreasing separation between tip and sample is discussed.
Keywords
Scanning tunneling microscopy , Electron energy loss spectroscopy (EELS) , Silicon , Germanium , Field emission microscopy , Auger electron spectroscopy
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1678123
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