Title of article
X-ray excitation of DX centers in Si-doped Al0.35Ga0.65As
Author/Authors
Soh، نويسنده , , Yeong-Ah and Aeppli، نويسنده , , Mark G. and Zimmermann، نويسنده , , Frank M. and Isaacs، نويسنده , , E.D. and Frenkel، نويسنده , , Anatoly I.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
5
From page
214
To page
218
Abstract
We report on the use of X-rays to excite DX centers in Si doped Al0.35Ga0.65As into their shallow donor state, as monitored by measuring the resulting persistent photoconductivity. The energy dependence of the photoconductivity closely follows the simultaneously detected X-ray fluorescence, indicating that photoexcitation of core holes is an efficient primary excitation step for the excitation of DX centers. However, there is no appreciable difference between the Ga and As K-edges, implying a non-local DX center excitation mechanism.
Keywords
Gallium arsenide , Electrical transport measurements , Semiconducting films , X-ray absorption spectroscopy , photoconductivity
Journal title
Surface Science
Serial Year
2000
Journal title
Surface Science
Record number
1678606
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