X-ray measurements with micro- and nanoresolution at BESSY

Capabilities of the KMC-2 beamline at BESSY for spatially resolved X-ray measurements with micro- and nanometer resolution have been reviewed. A combination of experimental methods of X-ray fluorescence analysis and extended X-ray absorption fine spectroscopy with X-ray standing waves technique was applied for the depth profiling of Si/W/Si layers with sub-nanometer resolution. The investigated layers were placed into the waveguide structure formed by two Au films to increase sensitivity and accuracy of the measurements. In-depth resolution on the order of 1 nm for the structure measurements has been obtained.