Title of article
Generation of glass SiO2 structures by various cooling rates: A molecular-dynamics study
Author/Authors
Lee، نويسنده , , Byoung Min and Baik، نويسنده , , Hong Koo and Seong، نويسنده , , Baek Seok and Munetoh، نويسنده , , Shinji and Motooka، نويسنده , , Teruaki، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
6
From page
203
To page
208
Abstract
Molecular-dynamics (MD) simulations using the modified parameters of the Tersoff interatomic potential have been performed to investigate the change of the structural and dynamical properties of glass SiO2 with various cooling rates. Although the properties and atomic configurations of glass formed by a fast cooling rate of ∼1013 K/s could be reproduced well, they contained more structural defects. The local order and coordination defect of system increases with decreasing cooling rate. The origin of atomic structural change and the bond angle distribution is understood on the basis of corner-sharing and edge-sharing tetrahedral structures. Results of the phonon density of states also exhibit a dependence on the cooling rates. When the cooling rate is decreased, the spectrum of the glass SiO2 shifts toward the higher frequencies due to the higher bending frequency.
Keywords
MD simulations , silica , SiO2 structure
Journal title
Computational Materials Science
Serial Year
2006
Journal title
Computational Materials Science
Record number
1681773
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