• Title of article

    Self-diffusion on Pd(111)

  • Author/Authors

    Steltenpohl، نويسنده , , Anton and Memmel، نويسنده , , Norbert، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2000
  • Pages
    4
  • From page
    558
  • To page
    561
  • Abstract
    The barrier and prefactor for self-diffusion of Pd on Pd(111) are derived from scanning tunneling investigations of the homoepitaxial growth of Pd/Pd(111). The barrier for diffusion is found to be 350 meV. This is the highest value observed so far for self-diffusion on a fcc(111) metal surface. Such exceptional behaviour has recently been predicted, as Pd(111) — unlike other fcc(111) transition metals — does not support an occupied free-electron like surface state. An exceptionally high prefactor of 6×1016 s−1 is observed, indicating a large entropic contribution to diffusion in accordance with the Meyer–Neldel compensation law.
  • Keywords
    Diffusion and migration , PALLADIUM , epitaxy , Scanning tunneling microscopy , surface diffusion , Low index single crystal surfaces
  • Journal title
    Surface Science
  • Serial Year
    2000
  • Journal title
    Surface Science
  • Record number

    1688182