Title of article
Self-diffusion on Pd(111)
Author/Authors
Steltenpohl، نويسنده , , Anton and Memmel، نويسنده , , Norbert، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
4
From page
558
To page
561
Abstract
The barrier and prefactor for self-diffusion of Pd on Pd(111) are derived from scanning tunneling investigations of the homoepitaxial growth of Pd/Pd(111). The barrier for diffusion is found to be 350 meV. This is the highest value observed so far for self-diffusion on a fcc(111) metal surface. Such exceptional behaviour has recently been predicted, as Pd(111) — unlike other fcc(111) transition metals — does not support an occupied free-electron like surface state. An exceptionally high prefactor of 6×1016 s−1 is observed, indicating a large entropic contribution to diffusion in accordance with the Meyer–Neldel compensation law.
Keywords
Diffusion and migration , PALLADIUM , epitaxy , Scanning tunneling microscopy , surface diffusion , Low index single crystal surfaces
Journal title
Surface Science
Serial Year
2000
Journal title
Surface Science
Record number
1688182
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