Title of article
Adsorption and chemical reaction of Cu(hfac)(vtms) on Cu(1 1 1)
Author/Authors
Chung، نويسنده , , Young Su and Lee، نويسنده , , Hyoo Suk and Lee، نويسنده , , Yoon Sup and Kim، نويسنده , , Sehun، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
6
From page
312
To page
317
Abstract
We have investigated the adsorption and reaction of Cu(hfac) (vtms) (hexafluoroacetylacetonate, hfac; vinyl trimethyl silane, vtms) on a Cu(1 1 1) surface. The recombinative desorption of Cu(hfac)(vtms) and disproportionation reaction between adsorbed Cu(hfac) molecules were observed to occur between 240 and 400 K. The adsorption geometries of Cu(hfac) on Cu(1 1 1) have been also calculated by means of the extended Hückel method. It is found that the standing Cu(hfac) is more stable and favored for a cleavage of Cu–O bonds than the lying-down Cu(hfac) on the Cu(1 1 1) surface.
Keywords
Semi-empirical models and model calculations , Thermal desorption spectroscopy , Copper , Surface chemical reaction
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1689986
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