Title of article
An X-ray photoelectron diffraction structural characterization of an epitaxial MnO ultrathin film on Pt(1 1 1)
Author/Authors
Rizzi، نويسنده , , G.A and Petukhov، نويسنده , , M. and Sambi، نويسنده , , M. and Zanoni، نويسنده , , R. and Perriello، نويسنده , , L. and Granozzi، نويسنده , , G.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
7
From page
1474
To page
1480
Abstract
An epitaxial ultrathin MnO/Pt(1 1 1) film (13 إ thick) has been grown by reactive UHV deposition of Mn2(CO)10 on Pt(1 1 1) at 200°C in the presence of water. Angle scanned X-ray photoelectron diffraction (XPD) and LEED have been used to structurally characterize the film.
served 1×1 LEED pattern is in accord with the bulk lattice parameter of a MnO(1 1 1) surface (3.14 إ) and demonstrates that the film is ordered in the long range. Full hemispherical O1s and Mn2p XPD plots have been obtained and analysed on the basis of multiple scattering calculations. The XPD data confirm that the MnO(1 1 1) surface (as a single domain) is exposed and a best fit procedure based on a R-factor analysis provides a direct evidence for a relaxation of the outermost double layer, whose values are similar to those found in other similar systems (CoO and FeO).
Keywords
growth , epitaxy , Metal–oxide–semiconductor (MOS) structures , Metal–semiconductor magnetic thin film structures , X-ray photoelectron spectroscopy , Surface chemical reaction , Photoelectron diffraction measurement
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1690409
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