Title of article
The lateral variation of solid state reactions at surfaces studied by means of photoemission electron microscopy: formation of titanium silicides
Author/Authors
Schmidt، نويسنده , , O and Fecher، نويسنده , , G.H، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
6
From page
335
To page
340
Abstract
The alloying and oxygen reduction at titanium silicon interfaces were studied by means of photoemission microscopy. The microscopic chemical composition of the sample surface was characterised by means of imaging X-ray absorption. The silicide formation was studied at clean and oxidised silicon substrates both covered with micron-sized titanium patterns.
Keywords
X-ray absorption spectroscopy , Silicides , Titanium , Electron microscopy
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1691005
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