Title of article
Electronic interaction at the TiO2–Al2O3 interface as observed by X-ray absorption spectroscopy
Author/Authors
Sلnchez-Agudo، نويسنده , , M and Soriano، نويسنده , , L and Quirَs، نويسنده , , C and Avila، نويسنده , , J and Sanz، نويسنده , , J.M، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
6
From page
470
To page
475
Abstract
The electronic structure of the TiO2–Al2O3 interface has been studied using X-ray absorption spectroscopy. Special attention has been paid to the early stages of growth, i.e. the sub-monolayer regime (θ<1). The Ti 2p spectra for coverages below 1 ML show significant changes with respect to those for large coverages and bulk TiO2 indicating the presence of interfacial states. The spectra have been compared with atomic multiplet calculations reported in the literature. From this comparison it is concluded that strong electronic interactions occur at the interface, as deduced from the significant lowering of the crystal field of the Ti atoms at the interface (1.0 eV) as compared with bulk TiO2 (1.8 eV). It is suggested that the important covalent character of the bonding of the Al2O3 substrate is the responsible of this crystal field lowering.
Keywords
Coatings , Insulating films , Near edge extended X-ray absorption fine structure (NEXAFS) , Interface states , Aluminum oxide , Titanium oxide
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1691068
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