Title of article
Origin of X-ray photon stimulated desorption of Cl+ and Cl2+ ions from Cl/Si(1 1 1)-(1×1)
Author/Authors
Flege، نويسنده , , J.I. and Schmidt، نويسنده , , Th. and Falta، نويسنده , , J. and Materlik، نويسنده , , G.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2002
Pages
8
From page
381
To page
388
Abstract
In this paper we investigate minority adsorption sites on Cl/Si(1 1 1)-(1×1) with the X-ray standing wave technique. By a combination with X-ray photon stimulated desorption, we show that the coordinates of the desorption-active chlorine minority adsorption site can be determined analytically if standing wave difference spectra are recorded at the chlorine 1s absorption edge. Furthermore, the direct and indirect contributions to the total Cl+ and Cl2+ ion desorption yields above the chlorine K edge can be separated and the ratio of the atomic desorption cross-sections can be estimated.
Keywords
Diffraction , X-Ray scattering , and reflection , Photon stimulated desorption (PSD) , X-ray standing waves , morphology , Roughness , and topography , Silicon , Chlorine , Surface defects , surface structure
Journal title
Surface Science
Serial Year
2002
Journal title
Surface Science
Record number
1694367
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