Title of article
Edge-dimer row – The reason of three-bilayer steps and islands stability on Si(1 1 1)-7 × 7
Author/Authors
Neizvestny، نويسنده , , I.G. and Romanyuk، نويسنده , , K.N. and Shwartz، نويسنده , , N.L. and Teys، نويسنده , , S.A. and Yanovitskaya، نويسنده , , Z.Sh. and Zverev، نويسنده , , A.V.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2006
Pages
8
From page
3079
To page
3086
Abstract
A hypothesis of perpendicular dimer row formation along three-bilayer (3 BL) step was suggested. The hypothesis, explains the stability of 3 BL steps on the vicinal Si(1 1 1) surface deflected in 〈 1 ¯ 1 ¯ 2 〉 direction as well as the limitation of Ge and Si island height by 3 BL at the initial nucleation stages on Si(1 1 1) surface. The detailed examinations of STM images of 3 BL steps were carried out. New peculiarities of atomic structure of 3 BL single step on Si(1 1 1) and 3 BL steps on Si(5 5 7) surfaces were revealed. The results of STM images examination verify the hypothesis of perpendicular dimer row formation along the boundary of the 3 BL step.
Keywords
Silicon , Germanium , Three-bilayer steps , Triangle islands , dimers , Scanning tunneling microscopy (STM)
Journal title
Surface Science
Serial Year
2006
Journal title
Surface Science
Record number
1698764
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