Title of article
An XPS study on the surface reduction of V2O5(0 0 1) induced by Ar+ ion bombardment
Author/Authors
Silversmit، نويسنده , , Geert and Depla، نويسنده , , Diederik and Poelman، نويسنده , , Hilde and Marin، نويسنده , , Guy B. and De Gryse، نويسنده , , Roger، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2006
Pages
6
From page
3512
To page
3517
Abstract
The effect of the irradiation with Al Kα X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(0 0 1) crystal was examined. Afterwards, the surface reduction of the V2O5(0 0 1) surface under Ar+ bombardment was studied. The degree of reduction of the vanadium oxide was determined by means of a combined analysis of the O1s and V2p photoelectron lines. Asymmetric line shapes were needed to fit the V3+2p photolines, due to the metallic character of V2O3 at ambient temperature. Under Ar+ bombardment, the V2O5(0 0 1) crystal surface reduces rather fast towards the V2O3 stoichiometry, after which a much slower reduction of the vanadium oxide occurs.
Keywords
V2p photoelectron core level , Vanadium oxidation state , Vanadium oxide , V2O5(0 , 0 , X-Ray Photoelectron Spectroscopy (XPS) , 1) , XPS analysis
Journal title
Surface Science
Serial Year
2006
Journal title
Surface Science
Record number
1698870
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