• Title of article

    Interdiffusion process in the InSe/Pt interface studied by angle-resolved photoemission

  • Author/Authors

    Sلnchez-Royo، نويسنده , , J.F. and Segura، نويسنده , , A. and Pellicer-Porres، نويسنده , , J. and Chevy، نويسنده , , A.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2006
  • Pages
    5
  • From page
    3734
  • To page
    3738
  • Abstract
    The electronic structure of the InSe/Pt interface has been studied by angle-resolved and X-ray photoemission measurements. From these results, it has been found that Pt incorporates into the InSe lattice at initial stages of Pt deposition, acting as a surface acceptor-like which tends to turn the interface into intrinsic. Beyond certain Pt submonolayer coverage, the band-bending process appears to be controlled by localized states appearing close to the Fermi level. The appearance of these states has been attributed to a reaction-like mechanism between diffused Pt and InSe atoms. For this interface, it has been found that a final electronic barrier of ∼1.2 eV is formed, close to that expected for an abrupt InSe/Pt Schottky barrier. Nevertheless, the atomic structure of the interface is far from that expected for an ideal Schottky interface.
  • Keywords
    Reactivity , Layered compounds , Schottky interfaces , Metal-semiconductor interfaces , X-ray photoemission
  • Journal title
    Surface Science
  • Serial Year
    2006
  • Journal title
    Surface Science
  • Record number

    1699206