Title of article
X-ray absorption and photoemission spectroscopy of 3C- and 4H-SiC
Author/Authors
Tallarida، نويسنده , , M. and Schmeisser، نويسنده , , D. and Zheng، نويسنده , , F. J. Himpsel، نويسنده , , F.J.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2006
Pages
5
From page
3879
To page
3883
Abstract
We have studied the electronic properties of 3C- and 4H-SiC with X-ray absorption (XAS). Particular emphasis is placed on the conduction bands because they exhibit larger differences between the various SiC polytypes than valence bands. XAS spectra at the Si2p and C1s edges provide projections onto Si3d, 4s and C2p conduction band states. We explain the observed differences in the Si L2,3 XAS data to arise from transition into dispersive bands which occur at the M and K point of the hexagonal Brillouin zone. The XAS data are sensitive to a difference in the dispersion of the two lowest conduction bands. For 3C-SiC the dispersion is larger than for 4H-SiC in agreement with theory. We compare the XAS data at the Si L edge with CFS and CIS spectra and find that the SiLVV Auger is dominant.
Keywords
NEXAFS , silicon carbide , Photoelectron emission
Journal title
Surface Science
Serial Year
2006
Journal title
Surface Science
Record number
1699306
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