• Title of article

    Study of oxidized Cu(1 1 0) surface using noncontact atomic force microscopy

  • Author/Authors

    Kishimoto، نويسنده , , Shohei and Kageshima، نويسنده , , Masami and Naitoh، نويسنده , , Yoshitaka and Li، نويسنده , , Yan Jun and Sugawara، نويسنده , , Yasuhiro، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2008
  • Pages
    8
  • From page
    2175
  • To page
    2182
  • Abstract
    Formation of an oxidized overlayer onto Cu(1 1 0) surface was examined by means of noncontact atomic force microscopy at oxidation temperature ranging from RT to 610 °C and an O2 exposure from 104 to 105 L. Atomic resolution images of an c(6 × 2) reconstruction exhibited different contrasts from those obtained in STM studies and coincided well with the presented structural model. The surface oxidized at RT in the present exposure range exhibited a rough morphology, and was observed to undergo a partial transition to the c(6 × 2) structure at 25,000 L. At an oxidation temperature of 360 °C an well-ordered c(6 × 2) reconstruction was observed to cover the entire terrace irrespective of the exposure amount. Characteristic point defect was also imaged on this surface in detail. At an oxidation temperature of 610 °C a (2 × 1) reconstruction was observed to coexist on the same terrace with c(6 × 2). Formation mechanism of this coexistence phase in this high temperature regime is discussed.
  • Keywords
    Roughness , and topography , Surface structuremorphology , Oxidation , oxides , Oxygen , atomic force microscopy , Surface relaxation and reconstruction , Copper , Insulating surfaces
  • Journal title
    Surface Science
  • Serial Year
    2008
  • Journal title
    Surface Science
  • Record number

    1703383