Title of article
Submicron gold structures formed by atomic force microscopy lithography on thin films of poly(methyl methacrylate)
Author/Authors
Kongshaug، Kjell Ove نويسنده , , Kjell Ove and Steen، نويسنده , , Helge، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2008
Pages
6
From page
3051
To page
3056
Abstract
Thin films of poly(methyl methacrylate) (PMMA) (25 nm) deposited on gold coated glass substrates have been locally modified by exposure to biased atomic force microscopy (AFM) tips. Constant exposure currents in the range of 0.5–0.65 nA leads to removal of PMMA both by direct ablation and enhanced solubility in a developer solution. Possible mechanisms causing such modifications have been discussed. Submicron Au structures were formed by combining AFM lithography, involving localized removal of PMMA, with sputter deposition of gold and a lift-off process.
Keywords
Atomic force microscopy lithography , poly(methyl methacrylate) , Electrochemical phenomena , Thermal decomposition
Journal title
Surface Science
Serial Year
2008
Journal title
Surface Science
Record number
1703765
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