Surface morphology and composition of c-, a- and m-sapphire surfaces in O2 and H2 environments

This paper reports that monitoring the composition of the c(0 0 0 1), a(11–20) and m(10–10) sapphire surfaces is essential for a proper interpretation of the surface morphologies obtained after annealing at 1253 and 1473 K in ArH2 or ArO2 atmospheres. Our experimental investigations, which have used Auger electron spectroscopy (AES) and atomic force microscopy (AFM) on the surfaces of 99.99% pure sapphire wafers, have led to the following original conclusions: (i) Calcium segregates at the c-surface of sapphire both under ArO2 and ArH2. (ii) Potassium adsorption enhances the kinetics of step-bunching on the c-surface under ArO2. (iii) The step edges on the a-surface may develop a comb-like morphology made of parallel strips along the [10–10] direction. (iv) At 1253 K, clean m-surfaces may be stable. (v) Under ArH2, alumina surface diffusion is much slower than under ArO2 for all surface orientations, the surface concentration of impurities is low, and the Al–O ratio of the AES signals at the surface is significantly larger.