• Title of article

    Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model

  • Author/Authors

    Dusciac، نويسنده , , D. and Henry de Villeneuve، نويسنده , , C. and Allongue، نويسنده , , P. and Ozanam، نويسنده , , F. and Chazalviel، نويسنده , , J.-N.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2013
  • Pages
    6
  • From page
    230
  • To page
    235
  • Abstract
    A recent spectroscopic study showed that alkoxy monolayers grafted on a (111) silicon surface thermally decompose in the 200–400 °C range by fragmentation of the alkyl chains [Surf. Sci. 601 (2007) 3961]. Here this behavior is reproduced by a numerical simulation, assuming that the elementary fragmentation steps have different probabilities, depending on the length of the fragments formed. The variation of the CH2/CH3 ratio, as determined experimentally by infrared spectroscopy, is reproduced with a set of fragmentation probabilities consistent with the enthalpy variation associated with each corresponding step.
  • Keywords
    grafting , Organic monolayers , Silicon , thermal stability
  • Journal title
    Surface Science
  • Serial Year
    2013
  • Journal title
    Surface Science
  • Record number

    1705698