Title of article
Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model
Author/Authors
Dusciac، نويسنده , , D. and Henry de Villeneuve، نويسنده , , C. and Allongue، نويسنده , , P. and Ozanam، نويسنده , , F. and Chazalviel، نويسنده , , J.-N.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2013
Pages
6
From page
230
To page
235
Abstract
A recent spectroscopic study showed that alkoxy monolayers grafted on a (111) silicon surface thermally decompose in the 200–400 °C range by fragmentation of the alkyl chains [Surf. Sci. 601 (2007) 3961]. Here this behavior is reproduced by a numerical simulation, assuming that the elementary fragmentation steps have different probabilities, depending on the length of the fragments formed. The variation of the CH2/CH3 ratio, as determined experimentally by infrared spectroscopy, is reproduced with a set of fragmentation probabilities consistent with the enthalpy variation associated with each corresponding step.
Keywords
grafting , Organic monolayers , Silicon , thermal stability
Journal title
Surface Science
Serial Year
2013
Journal title
Surface Science
Record number
1705698
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