Preparation of TiO2 thin films on glass beads by a rotating plasma reactor

We experimentally coated the TiO2 thin films on the glass beads by a rotating cylindrical plasma chemical vapor deposition (PCVD) process. The precursors for the thin films were generated by the plasma reactions, and they deposited on the glass beads to become the grains on the films. The TiO2 thin films grow more quickly on the glass beads by increasing the reactor pressure, or the rotation speed of the reactor. As the applied power increases, the thickness of the thin films on the glass beads decreases. As the thickness of the TiO2 thin films increases, the uniformity of the TiO2 thin films decreases due to the deposition of larger grains or due to the increase of crack size. The rotating cylindrical PCVD process can be a good method to prepare the particles coated with metal or organic-doped thin films for highly functionalized materials.