Improved performance of dye-sensitized solar cells with compact TiO2 blocking layer prepared using low-temperature reactive ICP-assisted DC magnetron sputtering

This study discusses about carrier blocking effects of a compact TiO2 deposited onto fluorine-doped tin oxide (FTO) to improve the performance of dye-sensitized solar cells (DSSCs). The compact TiO2 blocking layer is prepared by reactive inductively coupled plasma (ICP)-assisted DC magnetron sputtering without substrate heating. The resulting layer yields a 47% improvement in the energy conversion efficiency, indicating that the blocking layer prepared by low temperature ICP-assisted sputtering effectively prevents physical contact with the FTO. This process may suggest a new method for fabricating photoelectrodes which consist of TiO2 blocking layer for use in flexible DSSCs.