Polymerization of bisphenol a using Coprinus cinereus peroxidase (CiP) and its application as a photoresist resin

Bisphenol A was polymerized by Coprinus cinereus peroxidase in aqueous 2-propanol solution. Various polymerized products with different molecular weights and hydroxyl values were synthesized depending on the reaction compositions (the ratio of aqueous buffer to 2-propanol). Poly(bisphenol A), a polymer of bisphenol A, was mixed with a diazonaphthoquinone derivative to form a new type of photoresist. A thin photoresist film was formed on the silicon wafer and exposed to UV light for different lengths of time. Poly(bisphenol A) having a molecular weight of approximately 3000 yielded sharply contrasted patterns as compared with the other poly(bisphenol A)s having different molecular weights.