Title of article
Optimized nickel-oxide-based electrochromic thin films
Author/Authors
Avendaٌo، نويسنده , , E. and Azens، نويسنده , , A. and Isidorsson، نويسنده , , J. and Karmhag، نويسنده , , R. and Niklasson، نويسنده , , G.A and Granqvist، نويسنده , , C.G.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2003
Pages
5
From page
169
To page
173
Abstract
Reactive DC magnetron sputtering was used to make oxide films based on Ni, NiV0.08, NiAl0.56, NiMg0.8, and NiV0.08Mg0.5. All of these films were capable of showing electrochromism in KOH. The addition of Al or Mg increased the luminous transmittance significantly, while the charge capacity was maintained. Al- and Mg-containing films are superior to the conventional Ni oxide electrodes for applications requiring high bleached-state transmittance, such as architectural “smart windows”.
Keywords
Sputtering conditions , Nickel-based oxides , Thin films , electrochromism , Transmittance
Journal title
Solid State Ionics
Serial Year
2003
Journal title
Solid State Ionics
Record number
1715626
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