Title of article
A comparison of near-field lithography and planar lens lithography
Author/Authors
Melville، نويسنده , , D.O.S. and Blaikie، نويسنده , , R.J. and Alkaisi، نويسنده , , M.M.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2006
Pages
4
From page
415
To page
418
Abstract
The resolution of a near-field lithography technique that uses a planar silver lens to form a near-field image has been investigated and compared with hard-contact lithography. Sub-diffraction-limited imaging has been observed through a 50 nm silver film, confirming a recent superlensing proposal [J.B. Pendry, Phys. Rev. Lett. 85 (2000) 3966], with grating periods down to 170 nm pitch being patterned into resist using simple broadband UV-illumination.
Keywords
Superlens , Silver lens , Perfect lens , Negative refraction
Journal title
Current Applied Physics
Serial Year
2006
Journal title
Current Applied Physics
Record number
1770079
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