Photopatterning of self-assembled monolayers to generate aniline moieties

Comparative studies on the image-wise formation of surface aniline moieties in monolayers of silica substrates prepared by the photodegradation of surface-adsorbed 4-aminophenyltrimethoxysilane and the photodeprotection of chemisorbed o-nitrobenzyl N-phenylcarbamate monolayers were described. The difference in physicochemical affinity of imagewise UV-exposed surfaces was visualized clearly by the adsorption of fluorescent polystyrene microspheres on areas incorporating aniline moieties through diazotization.