Title of article
A highly intense state-selected OH beam source by the pulsed electric DC discharge method
Author/Authors
Ikejiri، نويسنده , , K and Ohoyama، نويسنده , , H and Nagamachi، نويسنده , , Y and Teramoto، نويسنده , , T and Kasai، نويسنده , , T، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
6
From page
255
To page
260
Abstract
A high intensity pulsed DC discharge source for OH radical beam was developed by the systematic optimization for geometry of the discharge source and for the operation conditions. OH radicals produced in the DC discharge source were state-selected by an electrostatic hexapole field. The maximum OH flux in the lowest |J,Ω,M〉=|3/2,3/2,3/2〉 state was directly measured to be 8.5 × 1014 radicals cm−2 s−1 at the beam crossing point of 150 cm downstream from nozzle by a saturated laser-induced fluorescence spectroscopy for the Q1(1) transition in A2Σ←X2Π3/2 transition.
Journal title
Chemical Physics Letters
Serial Year
2003
Journal title
Chemical Physics Letters
Record number
1783489
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