• Title of article

    Temperature dependence of the breakdown voltage for reverse-biased GaN p–n–n+ diodes

  • Author/Authors

    Aggarwal، نويسنده , , R.L. and Melngailis، نويسنده , , I. and Verghese، نويسنده , , S. and Molnar، نويسنده , , R.J. and Geis، نويسنده , , M.W. and Mahoney، نويسنده , , L.J.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    5
  • From page
    549
  • To page
    553
  • Abstract
    The temperature dependence of the breakdown voltage VB, due to impact ionization at high electric fields, for reverse-biased GaN p–n–n+ diodes has been measured at temperatures T between 98 and 248 K. The observed increase of VB with T is in excellent agreement with a simple model for the scattering of carriers by phonons with an effective energy of 42 meV. The impact ionization coefficients for the electrons and holes are nearly equal, and their geometric mean has the value 4×104 cm−1 at the breakdown electric fields, in good agreement with recent theoretical results for 300 K.
  • Keywords
    A. Semiconductors , B. Epitaxy , D. phonons
  • Journal title
    Solid State Communications
  • Serial Year
    2001
  • Journal title
    Solid State Communications
  • Record number

    1786550