Title of article
A numerical study of the effect of gas injection position in an inductively coupled plasma discharge
Author/Authors
Kwon، نويسنده , , Deuk Chul and Yoon، نويسنده , , N.S. and Han، نويسنده , , J.H. and Shon، نويسنده , , J.W.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2009
Pages
5
From page
546
To page
550
Abstract
We numerically study the effect of the gas injection position in an inductively coupled plasma (ICP) discharge. To study the effect, we present an injection model when a nozzle is placed inside of the chamber. The results show that the dependency of the neutral density is sensitive, while the difference of the charged particle density is negligible. The electron temperature difference at the injection positions increases slightly when the pressure decreases.
Keywords
Simulation , ICP , Fluid
Journal title
Current Applied Physics
Serial Year
2009
Journal title
Current Applied Physics
Record number
1786697
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