• Title of article

    A numerical study of the effect of gas injection position in an inductively coupled plasma discharge

  • Author/Authors

    Kwon، نويسنده , , Deuk Chul and Yoon، نويسنده , , N.S. and Han، نويسنده , , J.H. and Shon، نويسنده , , J.W.، نويسنده ,

  • Issue Information
    دوماهنامه با شماره پیاپی سال 2009
  • Pages
    5
  • From page
    546
  • To page
    550
  • Abstract
    We numerically study the effect of the gas injection position in an inductively coupled plasma (ICP) discharge. To study the effect, we present an injection model when a nozzle is placed inside of the chamber. The results show that the dependency of the neutral density is sensitive, while the difference of the charged particle density is negligible. The electron temperature difference at the injection positions increases slightly when the pressure decreases.
  • Keywords
    Simulation , ICP , Fluid
  • Journal title
    Current Applied Physics
  • Serial Year
    2009
  • Journal title
    Current Applied Physics
  • Record number

    1786697