Production of large-area coatings on glasses and plastics

This article describes an extended DC magnetron with a cylindrical cathode. The magnetron design provides for sputtering the cathode material on two opposite sides, allowing one to deposit coatings simultaneously on two plane substrates of area up to 2×3 m2. An extended ion source of magnetron type designed for cleaning and modification of the substrate surface prior to coating deposition is described as well. The characteristics of low-emissivity coatings on glasses and of conductive coatings on plastics are given. An electric circuit for pulsed power of a magnetron sputtering system, based on an artificial pulse-forming line, is proposed. The results of experiments where diamond-like films were deposited on large-area substrates by the method of pulsed magnetron sputtering of a graphite target synchronized with a pulsed high-voltage bias applied to the substrate are presented.