Twist filter for the removal of macroparticles from cathodic arc plasmas

Cathodic arc plasmas are known to be contaminated with macroparticles. A variety of magnetic plasma filters have been used with various success in removing the macroparticles from the plasma. In this publication, an open-architecture, double-bent filter that is twisted (‘Twist Filter™’) is described. A cathodic arc plasma deposition system was designed around this novel, very compact and efficient filter. Its major application is the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.