Plasma-based ion implantation and its application to three-dimensional materials

For conformal ion implantation into three-dimensional materials by plasma-based ion implantation (PBII), the production of a uniform, large-volume plasma is required and the ion-sheath evolution must be controlled. The production of a high-density plasma is desirable in order for efficient material processing by PBII, and for reducing the ion-sheath evolution time. In this article, first some newly developed high-density gas and metal/solid plasmas developed in Japan are introduced. Second, the technology for removal of macroparticles is described. Inductively coupled plasmas and helicon-wave-excited plasmas in the radio frequency regions are treated as high-density gas plasmas. Off-resonance microwave plasmas and surface-wave-excited plasmas are also presented. In the area of metal and solid-state plasmas, the shunting arc plasma is introduced. Concerning the removal of macroparticles, methods using magnetic filters, magnetic forces, and shield plates are discussed.