• Title of article

    Measurement of sheath expansion in plasma source ion implantation

  • Author/Authors

    Kim، نويسنده , , Young Woo and Kim، نويسنده , , Gon-Ho and Han، نويسنده , , Seunghee and Lee، نويسنده , , Yeonhee and Cho، نويسنده , , Jeonghee and Rhee، نويسنده , , Soo-Yong، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    5
  • From page
    97
  • To page
    101
  • Abstract
    In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse.
  • Keywords
    Time-dependent sheath , Plasma source ion implantation , Langmuir Probe , Ion wave
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2001
  • Journal title
    Surface and Coatings Technology
  • Record number

    1800623